UHV  Systems

At UltraHighVacuum.com, we are proud to offer an extensive range of UHV systems designed to meet the precise demands of advanced research and industrial applications. Our systems are categorised into three main areas: 

Physical Vapour Deposition (PVD), delivering high-purity thin film & nanoparticle coatings for cutting-edge materials development

UHV Controlled Environment Transport Systems, ensuring pristine sample handling and transfer without contamination

Plasma-Enhanced Chemical Vapour Deposition (PECVD), providing superior film uniformity and efficiency for complex coatings

 Each system is precision engineered to deliver reliability, performance, and innovation, empowering our customers to achieve breakthrough results.

PLD 400 UHV Pulsed Laser Deposition System
SKU: PLD-400
Synthesis of complex materials & crystalline structures is a constantly growing request from research. Pulsed Laser Deposition (PLD) is one answer. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, superlattices, polymers and composites etc. Using years of comprehensive experience and know how in R&D deposition systems and ultra high vacuum technology, Vinci Technologies has designed a Laser deposition system, which is easy to operate and designed for academic & industrial researchers alike. Advantages: • Flexible & evolving • Full supervision • Cost effective Main features: • Thin film growth of complex materials • UHV • Oxygen-resistant 950°C 1’’ sample holder • Adjustable distance from substrate to target • Combinatorial deposition • RHEED as option • 10-8 mbar chamber • 10-9 mbar with load-lock • Regulated upstream/downstream pressure control • Transferable 1-inch substrate holder • Ports for in-situ characterization • Reactive or Pulsed Laser Deposition capability • 8-position target holder • Turbomolecular pumping • Optional load lock chamber ...more