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Vacuum Systems & Instruments

UHV  Systems

At UltraHighVacuum.com, we are proud to offer an extensive range of UHV systems designed to meet the precise demands of advanced research and industrial applications. Our systems are categorised into three main areas: 

Physical Vapour Deposition (PVD), delivering high-purity thin film & nanoparticle coatings for cutting-edge materials development

UHV Controlled Environment Transport Systems, ensuring pristine sample handling and transfer without contamination

Plasma-Enhanced Chemical Vapour Deposition (PECVD), providing superior film uniformity and efficiency for complex coatings

 Each system is precision engineered to deliver reliability, performance, and innovation, empowering our customers to achieve breakthrough results.

Small Scale Production Plasma-Enhanced Chemical Vapor Deposition System
SKU: PECVD-SS-VT
This system is used to deposit layers under high vacuum conditions on samples that are RF biased. It is a low temperature technique when compared to typical CVD process, which is a major advantage. Core System Features: • Base Pressure 1.10-6 mbar • Samples up to 300 mm • Inferior plate of 500 mm diameter with RF bias • Various Process gases (TMS, Hexane, CF4, O 2, Ar) • Pumping group (Suitable for corrosive gases) • Automated Control Applications: • Barrier Films • Insulators • Optical coatings • Biomedical Materials: • DLC • Doped/Undoped Amorphous Si • Dielectrics (Nitrides, Oxynitrides..) ...more
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