UHV  Systems

At UltraHighVacuum.com, we are proud to offer an extensive range of UHV systems designed to meet the precise demands of advanced research and industrial applications. Our systems are categorised into three main areas: 

Physical Vapour Deposition (PVD), delivering high-purity thin film & nanoparticle coatings for cutting-edge materials development

UHV Controlled Environment Transport Systems, ensuring pristine sample handling and transfer without contamination

Plasma-Enhanced Chemical Vapour Deposition (PECVD), providing superior film uniformity and efficiency for complex coatings

 Each system is precision engineered to deliver reliability, performance, and innovation, empowering our customers to achieve breakthrough results.

MBE 2D Epitaxy System for Ultrahigh Vacuum
SKU: MBE-2D
Introducing the MBE (2D) system—a sophisticated, state-of-the-art system engineered for the growth and surface analysis of novel materials and devices, including transition metal di-chalcogenide or topological insulator applications. Designed to operate under a pristine, controlled environment, this system empowers researchers to advance material science and device development. The MBE (2D) system is renowned for its exceptional base pressure capabilities, stable process pressure during heating & growth and versatile configuration options, making it an indispensable tool for advanced research in selective epitaxial growth and semiconductor equipment. Applications • III-V Ferromagnets • 2D Topological insulators • TMDs Core System Features: • Base Pressure 5 E 10-11 mbar • LN2 cryo shrouds • 2” molybloc sample puck or 3’’ bare wafer • Up to 6 Knudsen cells (35 cc) • Up to 3 cracker cells • 6 x 7 cc (or 4 x 15) linear E-beam • Pumping groups: TSP Ion Pump, Cryo or Turbomolecular Pumping • Heating &/or cooling sample stages • Growth feedback via flux gauge, quartz monitors • Integrated RHEED or RHEED AUGERS • Couples with Transfer tunnel, Load locks & Preparation chambers ...more