UHV  Systems

At UltraHighVacuum.com, we are proud to offer an extensive range of UHV systems designed to meet the precise demands of advanced research and industrial applications. Our systems are categorised into three main areas: 

Physical Vapour Deposition (PVD), delivering high-purity thin film & nanoparticle coatings for cutting-edge materials development

UHV Controlled Environment Transport Systems, ensuring pristine sample handling and transfer without contamination

Plasma-Enhanced Chemical Vapour Deposition (PECVD), providing superior film uniformity and efficiency for complex coatings

 Each system is precision engineered to deliver reliability, performance, and innovation, empowering our customers to achieve breakthrough results.

PVD20-EB Physical Vapor (Electron Beam) Deposition System
SKU: PVD20-EB
The PVD20-EB is a physical vapor deposition system, dedicated to the electron beam deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of everyday applications, as its simplicity to use and its competitive price. Core System Features: • D-shape steel – 500 mm diameter cylindrical chamber • Full access frontal door with 2 viewports for easy maintenance • Sample holder for substrates up to 6” in diameter • Rotating and water cooled substrate holder • Water cooling to avoid excess heating • Secured cryo pumping group E-Beam Evaporation: • 8X8 cc or 6X7 cc electron beam source (Ti, Au, Ag, Al, Cr, W, Pt) • Power supply from 3 kW to 12 kW • Gas panel for Ar, O2, N2 • Accurate control of deposition rates • Loadlock (option) • RF plasma pre-cleaning (option) ...more