PVD-4 is a physical vapor deposition system, dedicated to the evaporation or sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of everyday applications, as its simplicity to use and its competitive price.

Deposition techniques include:
• Thermal & EBeam Evaporation
• Magnetron Sputtering
• Hybrid Configuration
• Organic Configuration

Core System Features:
• Stainless Steel – 320 mm diameter cylindrical
• Fast Entry Frontal Door with viewport
• Sample holder for substrates up to 4” in diameter
• Water cooling to avoid excess heating