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- Small Scale Production Plasma-Enhanced Chemical Vapor Deposition System
Small Scale Production Plasma-Enhanced Chemical Vapor Deposition System
https://www.ultrahighvacuum.com/shop/pecvd-ss-vt-small-scale-production-plasma-enhanced-chemical-vapor-deposition-system-35495 https://www.ultrahighvacuum.com/web/image/product.template/35495/image_1920?unique=73a3859This system is used to deposit layers under high vacuum conditions on samples that are RF biased. It is a low temperature technique when compared to typical CVD process, which is a major advantage.
Core System Features:
• Base Pressure 1.10-6 mbar
• Samples up to 300 mm
• Inferior plate of 500 mm diameter with RF bias
• Various Process gases (TMS, Hexane, CF4, O 2, Ar)
• Pumping group (Suitable for corrosive gases)
• Automated Control
Applications:
• Barrier Films
• Insulators
• Optical coatings
• Biomedical
Materials:
• DLC
• Doped/Undoped Amorphous Si
• Dielectrics (Nitrides, Oxynitrides..)
Terms and Conditions
Shipping: Standard off-the-shelf stock items will be delivered within 3-5 working days. Non-stock and bespoke products will be advised on an individual basis.
Powerful Software
- Fully & Semi Automatic modes
- User mode Access Levels
Recipe modes for
- Thickness Rate & Deposition Time
- Pre-programmed recipe library
Process Acquisition software with:
- Rate deposition
- Thickness control
- Pressure Display
- Temperature Control
- Valve/Shutter management
Hardware
Integrated PC with Microsoft Windows

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